(2) for semiconductor manufacturing, a
device used to selectively block photolitho-
graphic exposure of sensitized coating used
for preventing a subsequent etching process
from removing material. A mask is analo-
gous to a negative in conventional photogra-
phy.
(3) a glass or quartz plate containing in-
formation (encoded as a variation in transmit-
tance and/or phase) about the features to be
printed. Also called a photomask or a reticle.
(4) in image processing, a small set of pix-
els, such as a 3
×3 square, that is used to trans-
form an image. Conceptually, the mask is
centered above every input pixel, each pixel
in the mask is multiplied by the correspond-
ing input pixel under it and the output (trans-
formed) pixel is the sum of these products. If
the mask is rotated 180
◦
before the arithmetic
is performed, the result is a 2-D convolution
and the mask represents the impulse response
function of a linear, space-invariant system.
Also called a kernel. See also
convolution
,
impulse response
,
kernel
.
mask aligner
a tool that aligns a pho-
tomask to a resist-coated wafer and then ex-
poses the pattern of the photomask into the
resist.
mask biasing
the process of changing the
size or shape of the mask feature in order for
the printed feature size to more closely match
the nominal or desired feature size.
mask blank
a blank mask substrate
(e.g., quartz) coated with an absorber (e.g.,
chrome), and sometimes with resist, and used
to make a mask.
mask linearity
the relationship of printed
resist feature width to mask feature width for
a given process.
mask programming
programming a
semiconductor read-only-memory (ROM)
by modifying one or more of the masks used
in the semiconductor manufacturing process.
mask set
consists of the dozen or so
(varies with process and company) individual
masks that are required to complete a MMIC
wafer fabrication from start to finish. Exam-
ples of masks or mask levels are “first level
metal” (defines all the primary metal struc-
ture on the circuit), “capacitor top plate” (de-
fines the pattern for the metal used to form the
top plate of MIM capacitors), and “dielectric
etch” (defines areas where dielectric (insula-
tor) material will be removed after coating
the entire wafer with it).
maskable interrupt
interrupt that can be
postponed to permit a higher-priority inter-
rupt by setting mask bits in a control register.
See also
nonmaskable interrupt
.
masking
a phenomenon in human vision
in which two patterns
P
1
and
P
1
+ P
2
cannot
be discriminated even though
P
2
is visible
when seen alone.
P
1
is said to mask
P
2
.
mass storage
a storage for large amounts
of data.
massively parallel architecture
a com-
puter system architecture characterized by
the presence of large numbers of CPUs that
can execute instructions in parallel.
The
largest examples can process thousands of
instructions in parallel, and provide efficient
pathways to pass data from one CPU to an-
other.
massively parallel processor
a system
that employs a large number, typically 1000
or more, of processors operating in parallel.
master
the system component responsi-
ble for controlling a number of others (called
slaves).
master boot record
a record of the disk
containing the first code and table that are
loaded at the bootstrap of the computer. It is
read even before the partition table sector.
c
2000 by CRC Press LLC