© 2000 by CRC Press LLC
Fred Leonberger
UT Photonics
Bloomfield, CT
Ging Li-Wang
Dexter Magnetic Materials
Fremont, CA
Yilu Liu
Virginia Tech
Blacksburg, VA
Jean Jacques Loiseau
Institute Recherche en Cybernetique
Nantes, France
Harry MacDonald
San Diego, CA
Chris Mack
FINLE Technologies
Austin, TX
Krzysztov Malinowski
Warsaw University of Technology
Warsaw, Poland
S. Manoharan
University of Auckland
Auckland, New Zealand
Horacio J. Marquez
University of Alberta
Edmonton, Alberta, Canada
Francesco Masulli
University of Genoa
Genoa, Italy
Vincent P. McGinn
Northern Illinois University
DeKalb, IL
John A. McNeill
Worcester Polytechnic Institute
Worcester, MA
David P. Millard
Georgia Institute of Technology
Atlanta, GA
Monte Miller
Rockwell Semiconductor Systems
Newbury Park, CA
Linn F. Mollenauer
AT&T Bell Labs
Holmdel, NJ
Mauro Mongiardo
University of Perugia
Perugia, Italy
Michael A. Morgan
Naval Postgraduate School
Monterey, CA
Amir Mortazawi
University of Central Florida
Orlando, FL
Michael S. Munoz
TRW Corporation
Paolo Nesi
University of Florence
Florence, Italy
M. Nieto-Vesperinas
Instituto de Ciencia de Materiales
Madrid, Spain
Kenneth V. Noren
University of Idaho
Moscow, ID